Rensselaer’s Center for Integrated Electronics operates the Micro- and NanoFabrication Clean Room (MNCR), a 5,700 square foot, Class 100 (ISO Class 5) facility. The MNCR supports research and education in microelectronics, energy, lighting, biotechnology, nanotechnology, materials science, and microelectromechanical systems (MEMS). In addition to serving as a platform for single-PI investigations, the facility enables faculty from diverse disciplines in science and engineering to establish collaborative, large-scale programs which would not otherwise be feasible. Fabrication of structures as small as 10 nm is possible in the MNCR, and structures as small as 1.5 nm can be visualized. Substrates ranging from a few millimeters in size to full wafers 200 mm in diameter can be accommodated.
- Plasma Enhanced Chemical Vapor Deposition
- Physical Vapor Deposition
- Oxidation, Diffusion & Annealing
- Standard and Deep Reactive Ion Etching
- Wet Chemical Processing
- Electron Microscopy
- Electron Beam Lithography
- FIB-based Deposition, Milling & Metrology
- TEM sample preparation
- 3-D Integration
- Wire Bonding
- Thin Film Characterization
- Electrical Testing
Who can access
Available to all departments and centers as well as to other universities and industrial users. MNCR technical staff members provide detailed training on all tools, and are available to assist users with process design issues. The MNCR is open 24 hours a day, 7 days a week.
Rates and Fees
Dr. Morris A. Washington, Director
David C. King, General Manager
Located on the CII’s 4th floor.